The Varian E500 is a medium-current ion implanter used for controlled doping of semiconductor wafers. The available equipment listing identifies the machine for 150 mm and 200 mm wafer processing.
The E500 family was supplied in several configurations and variants. The exact machine designation, implant-energy range, beam-current capability, ion source, wafer end station and installed process options must therefore be verified from the nameplate and configuration records.
Varian E500 Main Specifications
| Manufacturer | Varian Semiconductor Equipment Associates |
|---|---|
| Model | E500 |
| Equipment Type | Medium-Current Ion Implanter |
| Supported Wafer Sizes | 150 mm and 200 mm, according to the available equipment listing |
| Implant Current Class | Medium current |
| Machine Variant | E500 variant and installed upgrade level must be confirmed from the nameplate |
| Energy Range | Depends on whether the machine is a standard, HP, EHP, EHPi or other configured version |
| Ion Source | Installed source design and supported dopant species must be verified |
| Wafer End Station | Wafer size, scanning, tilt and rotation configuration must be confirmed |
| Dose Control | Beam monitoring, Faraday system and calibration status require inspection |
| Control Platform | Controller, workstation, software revision and communication interface vary by system |
| Condition | Used semiconductor equipment |
| Availability | Subject to current stock, inspection and configuration confirmation |
Key Equipment Features
Medium-current semiconductor ion implantation
Listed support for 150 mm and 200 mm wafers
Controlled ion-source extraction and mass analysis
Beam transport and wafer scanning for dose distribution
Configuration-dependent implant-angle and wafer-temperature control
Recipe and dose monitoring for production process control
Typical Applications
A Varian E500 medium-current configuration may be used for well formation, threshold-voltage adjustment, channel engineering and other medium-dose semiconductor implantation processes.
Some E500-family variants provide extended energy capability, but this should only be stated after the full model suffix and installed beamline have been confirmed. A standard E500 should not automatically be described using specifications from an E500HP, EHP or EHPi.
Used Equipment Configuration and Inspection
The first inspection priority is confirming the complete model suffix and upgrade history. Machines carrying the E500 name can differ significantly in acceleration hardware, beamline components, source configuration, wafer size and software.
Customers should inspect the source, extraction system, analyzing magnet, acceleration section, scanner, end station, dose controller, gas boxes, vacuum pumps, wafer robot, workstation, software licenses, safety systems and available process records.
Request Varian E500 Information
Contact our team to check the current availability of the used Varian E500. Please provide your wafer size, dopant species, required implant energy and dose, preferred E500 variant and destination facility.
Contact us for the exact model suffix, current equipment photos, installed configuration, inspection status and quotation.
Frequently Asked Questions
Is the Varian E500 a high-current or medium-current implanter?
The E500 product family is classified as a medium-current ion implantation platform.
What wafer sizes does the listed E500 support?
The source listing identifies 150 mm and 200 mm wafer capability. The installed wafer handler and end station must be checked for the required size.
Are all Varian E500 systems configured the same way?
No. E500, E500HP, EHP and EHPi configurations may have different energy ranges, acceleration equipment and process capabilities.
What information is required before confirming the specifications?
The machine nameplate, full model suffix, serial number, beamline configuration, source, wafer end station, gas system, software revision and equipment manuals should be reviewed.