The SEN GSD III 90 is a high-current ion implanter developed for semiconductor wafer doping. The available listing identifies the system for 150 mm and 200 mm wafers.
The GSD III platform combines an ion source, mass-analysis beamline, acceleration equipment, dose-control system and wafer end station. The exact installed components and process capability of this used machine should be confirmed before purchase.
SEN GSD III 90 Main Specifications
| Manufacturer | SEN / Sumitomo Eaton Nova |
|---|---|
| Model | GSD III 90 |
| Alternative Model Style | NV-GSD III-90 |
| Equipment Type | High-Current Ion Implanter |
| Supported Wafer Sizes | 150 mm and 200 mm, according to the available listing |
| Implant Current Class | High current |
| Beamline Configuration | Installed source, analyzing magnet and acceleration configuration must be confirmed |
| Wafer Processing | Wafer disk and batch configuration depend on the installed end station |
| Implant Angle | Tilt and rotation capability must be verified from the available machine |
| Dose Monitoring | Faraday and dose-control configuration must be inspected and calibrated |
| Process Species | Supported ions depend on the source, gas box and beamline history |
| Condition | Used semiconductor equipment |
| Availability | Subject to current stock, inspection and configuration confirmation |
Key Equipment Features
Production high-current ion implantation platform
Listed support for 150 mm and 200 mm wafers
Ion mass selection and controlled beam transport
Wafer-level dose and implant-uniformity control
Configuration-dependent batch wafer processing
Recipe-controlled operation for repeatable implantation
Typical Applications
The SEN GSD III 90 may be used for high-dose implantation in silicon-device production, including source and drain formation and other doping steps suited to high-current processing.
Application suitability depends on the required dopant, energy, beam current, dose, wafer temperature, implant angle and contamination limits. These requirements should be compared with the verified configuration of the available system.
Used Equipment Configuration and Inspection
The published model name does not confirm that all original source, beamline, gas, cooling and automation components remain installed. Missing cabinets or facility equipment can materially affect installation and recommissioning.
Customers should confirm the ion source, extraction electrodes, analyzing magnet, high-voltage equipment, wafer disk, dose controller, cooling unit, gas cabinets, vacuum pumps, robots, controller, software, manuals and current power-on status.
Request SEN GSD III 90 Information
Contact our team to check the current availability of the used SEN GSD III 90. Please provide your wafer size, implant species, energy range, required dose, implant-angle requirements and destination country.
Contact us for current machine photos, installed configuration, missing-item list, inspection status and quotation.
Frequently Asked Questions
Is the SEN GSD III 90 a high-current system?
Yes. Available equipment listings classify the GSD III 90 as a high-current ion implanter.
What wafer sizes are listed for this machine?
The source page identifies 150 mm and 200 mm wafers. Actual compatibility depends on the installed disk, cassette stations and wafer-handling parts.
What implant energy does the GSD III 90 provide?
The exact range should be verified from the installed high-voltage and beamline configuration. It should not be assumed only from the model name.
What delivery items are important for recommissioning?
Important items include the main beamline, source power supplies, high-voltage cabinets, gas boxes, wafer end station, cooling equipment, vacuum pumps, controller, software and safety systems.
