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KLA Tencor P-2 Long-Scan Stylus Profiler

Used KLA Tencor P-2 long-scan stylus profiler for step height, roughness and waviness measurement, with a published scan length up to 210 mm.

KLA Tencor P-2 Long-Scan Stylus Profiler EQUIPMENT IMAGE
Configuration Review Model and installed options
New / Used Supply Subject to project availability
Global Delivery Destination-based assessment
Technical RFQ Package and process matching

The KLA Tencor P-2 is a computerized long-scan stylus profiler used to measure step height, surface roughness, waviness and other vertical surface features. A mechanical stylus moves across the sample and records the surface profile as a series of height measurements.

The available listing identifies the equipment for 150 mm samples. The P-2 platform provides a maximum scan length of approximately 210 mm and selectable measurement ranges for high-resolution surface analysis or larger vertical features.

KLA Tencor P-2 long-scan stylus profiler

KLA Tencor P-2 Main Specifications

ManufacturerKLA-Tencor
ModelP-2
Equipment TypeLong-Scan Stylus Surface Profiler
Listed Sample Size150 mm / 6-inch
Maximum Scan LengthApproximately 210 mm
Published Scan Speed RangeApproximately 1 µm/s to 25 mm/s
High-Resolution Vertical RangeApproximately ±6.5 µm at 1 Å resolution
Extended Vertical RangeApproximately ±150 µm at 25 Å resolution
Maximum Profile DataUp to approximately 5,000 data points per scan
Accessible Measurement AreaUp to approximately 210 mm diameter without sample repositioning
Maximum Sample WeightApproximately 2.2 kg
Primary MeasurementsStep height, roughness, waviness and surface profile
ConditionUsed semiconductor equipment
AvailabilitySubject to current stock, inspection and configuration confirmation

Key Equipment Features

  • Long stylus scan length up to approximately 210 mm

  • Selectable high-resolution and extended vertical ranges

  • Measurement of step height, roughness and waviness

  • Computerized recipe, data collection and profile analysis

  • Up to approximately 5,000 measurement points per profile

  • Suitable for wafers, substrates, films and compatible flat samples

Typical Applications

The Tencor P-2 may be used to measure deposited-film steps, etched depths, photoresist thickness steps, surface roughness and long-range wafer or substrate waviness.

With suitable software and measurement procedures, profiler data may also support thin-film stress analysis using profiles collected before and after deposition. This capability should be confirmed from the installed software and accessories.

KLA Tencor P-2 stylus and sample stage

Used Equipment Configuration and Inspection

The stylus type, stylus radius, applied force, sample stage, rotary stage, vibration table, computer and software options can vary between used P-2 systems.

Before quotation, customers should confirm stylus condition, sensor calibration, stage travel, vertical-range operation, scan repeatability, computer boot condition, analysis software and included sample fixtures.

Request KLA Tencor P-2 Information

Contact our team to check the current availability of the used KLA Tencor P-2. Please provide your sample size, expected step-height range, surface material, required scan length and measurement application.

Contact us for equipment photos, installed stylus and stage configuration, measurement test results and quotation.

Frequently Asked Questions

What does the KLA Tencor P-2 measure?

It measures vertical surface profiles, including step height, roughness, waviness and etched or deposited film features.

What is the maximum scan length?

The published P-2 platform supports a scan length of up to approximately 210 mm. The usable scan length also depends on sample placement and stage configuration.

Can the P-2 measure soft photoresist?

It may measure photoresist steps, but stylus force and tip condition must be selected carefully to avoid scratching or deforming a soft film.

What should be inspected before purchasing a used profiler?

Important checks include stylus condition, sensor calibration, stage movement, vertical-range accuracy, vibration isolation, computer operation and measurement repeatability on a reference step.