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Besi Datacon 8800 CHAMEO Ultra Plus AC Hybrid Bonder

Find the right BESI ESEC 2100 FC hS for high-volume flip chip production. Compare performance, configuration, pricing and availability, with support matching the machine to your process requirements.

Besi Datacon 8800 CHAMEO Ultra Plus AC Hybrid Bonder EQUIPMENT IMAGE
Configuration Review Model and installed options
New / Used Supply Subject to project availability
Global Delivery Destination-based assessment
Technical RFQ Package and process matching

The Besi Datacon 8800 CHAMEO ultra plus AC is a high-accuracy hybrid bonding platform for die-to-wafer assembly. It is designed for advanced packaging applications that require precise alignment, strict particle control and automated 12-inch wafer handling.

Besi specifies system accuracy of 100 nm @ 3σ, an ISO 3 working area and dry-cycle throughput of up to 2,000 components per hour. The machine supports die sizes from 0.5 × 0.5 mm to 33 × 28 mm and die thicknesses from 25 μm to 800 μm.

Machine configuration may vary. Contact us for current availability, equipment photos, installed modules and location.

Besi Datacon 8800 CHAMEO ultra plus AC hybrid bonding system

Datacon 8800 CHAMEO Ultra Plus AC Specifications

ManufacturerBesi
ModelDatacon 8800 CHAMEO ultra plus AC
Equipment TypeHybrid bonding system
Primary ProcessDie-to-wafer hybrid bonding
System Accuracy100 nm @ 3σ, alignment worst corner GOG
CleanlinessISO 3 in the working area
Maximum ThroughputUp to 2,000 CPH, dry cycle
Substrate Wafer12-inch wafer through EFEM
Substrate Wafer Thickness0.5 to 2.0 mm
Component Supply12-inch film frame or 12-inch wafer carrier
Carrier MaterialSilicon or glass
Die Size0.5 × 0.5 mm to 33 × 28 mm
Die Thickness25 μm to 800 μm
Die EjectionNeedle, multi-stage or UV on request

These are platform specifications. The EFEM, inspection system, die-ejection method, tool changer, automation interface and other installed modules must be confirmed for each machine.

System Capabilities

  • High-resolution alignment:            the Van Gogh optical alignment system supports 100 nm-class die placement.

  • Controlled working area:            ISO 3 cleanliness helps protect prepared bonding surfaces from particle contamination.

  • Inline IR inspection:            placement can be checked without unloading the material from the system.

  • Thin-die handling:            supports die thicknesses down to 25 μm and different die-ejection methods.

  • Multi-chip handling:            integrated tool-changing options support different die formats within the production setup.

  • Factory automation:            host communication, automatic product changeover and process data interfaces are available.

  • Flexible installation:            the platform can be configured as a stand-alone bonder with EFEM loading or integrated into a cluster system.

Applications

The Datacon 8800 CHAMEO ultra plus AC is intended for advanced packages that require fine die-to-wafer alignment and a clean bonding environment. Typical applications include:

  • Die-to-wafer hybrid bonding

  • High-density semiconductor interconnects

  • Three-dimensional device integration

  • Thin-die stacking

  • Multi-chip advanced packaging

  • High-end logic, memory and heterogeneous integration modules

The incoming die and wafer surfaces must be prepared for the intended hybrid bonding process. Surface preparation, metrology and upstream cleaning equipment are separate parts of the complete production flow.

View related advanced packaging and hybrid bonding solutions.

Machine Configuration

Available machines may differ in EFEM setup, component supply, die-ejection hardware, inline IR inspection, tool-changing system, automation interface and cluster integration.

For an available unit, we can provide the known machine year, location, condition, equipment photos and installed configuration. Testing or inspection information will be supplied when available.

Availability and Quotation

Contact us for current availability and quotation. Please include the following information so the required machine configuration can be checked:

  • Required quantity and preferred equipment condition

  • Substrate wafer format and thickness

  • Die dimensions and thickness

  • Component supply method

  • Required inspection and automation modules

  • Stand-alone or cluster installation

  • Delivery country